Enhanced reflectivity and stability of Sc/Si multilayers

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5193, Issue , 2004, Pages 155-163

  Yulin, Sergiy ^a   Schäfers, Franz ^b   Feigl, Torsten ^a   Kaiser, Norbert ^a  

^a FRAUNHOFER INSTITUTE FOR APPLIED OPTICS AND PRECISION ENGINEERING   (Germany)

^b HAHN MEITNER INSTITUT   (Germany)

Author keywords

EUV; Multilayers; Reflectivity; Sc Sc; Thermal stability

Indexed keywords

ATOMIC FORCE MICROSCOPY; DIFFUSION; LIGHT REFLECTION; MAGNETRON SPUTTERING; SCANDIUM ALLOYS; THERMODYNAMIC STABILITY; TRANSMISSION ELECTRON MICROSCOPY; X RAY SCATTERING;

EUV; OPTICAL CONSTANTS; SC/SC;

MULTILAYERS;

EID: 1942518321     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.505582     Document Type: Conference Paper

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