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Surface Science

Volumn 589, Issue 1-3, 2005, Pages 164-172

Physico-chemical and X-ray optical characterizations of a Mo/Si multilayer interferential mirror upon annealing

(7) Jonnard, P a Jarrige, I a,d Benbalagh, R a,e Maury, H a Andre J M a Dankhazi Z b Rolland, G c

a SORBONNE UNIVERSITÉ (France)

b EÖTVÖS LORÁND UNIVERSITY (Hungary)

c CEA GRENOBLE (France)

d SPring 8 ^* (Japan)

e CAMECA (United States)

Author keywords

Annealing; Diffusion; Electronic structure; Interface; Molybdenum; Silicide; Silicon; X ray emission spectroscopy; X ray reflectivity

Indexed keywords

ANNEALING; ELECTRONIC STRUCTURE; MIRRORS; MOLYBDENUM; REFLECTION; SILICON; X RAY ANALYSIS; X RAYS;

DIFFUSION ANNEALING; INTERFACE; SILICIDE; SILICON MOLYBDENUM; X-RAY EMISSION SPECTROSCOPY;

MULTILAYERS;

EID: 23144453654 PISSN: 00396028 EISSN: None Source Type: Journal
DOI: 10.1016/j.susc.2005.05.058 Document Type: Article

Times cited : (19)

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