A fabrication technology for three-dimensional micro total analysis systems

Journal of Micromechanics and Microengineering

Volumn 20, Issue 4, 2010, Pages

  Zellner, Phillip ^a   Renaghan, Liam ^a   Hasnain, Zaki ^a   Agah, Masoud ^a  

^a VIRGINIA POLYTECHNIC INSTITUTE AND STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BURIED CHANNELS; CMOS COMPATIBLE; CONTROLLED TRANSITIONS; FABRICATION TECHNIQUE; FABRICATION TECHNOLOGIES; MASK OPENING; MASKING LAYERS; MICRO TOTAL ANALYSIS SYSTEMS; MICRO-FLUIDIC DEVICES; REACTIVE ION ETCH; SILICON MICROSTRUCTURES; SILICON SUBSTRATES; SINGLE ETCH; SINGLE-MASK; SUBSTRATE SURFACE; THREE DIMENSIONS; THREE-DIMENSIONAL (3D);

CHEMICAL VAPOR DEPOSITION; FABRICATION; MICROCHANNELS; MICROELECTRONICS; MICROSTRUCTURE; PLASMA DEPOSITION;

THREE DIMENSIONAL;

EID: 77949892100     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/20/4/045013     Document Type: Article

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