SCOPUS 정보 검색 플랫폼

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 6, 2001, Pages 2082-2088

Characterization of reactive ion etch lag scaling

(2) Keil, D a Anderson, E b

a LAM RESEARCH CORPORATION (United States)

b LAWRENCE BERKELEY NATIONAL LABORATORY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; DIFFERENTIAL EQUATIONS; MATHEMATICAL MODELS; NONLINEAR EQUATIONS; OXIDES; PHOTORESISTS; RATE CONSTANTS; THICKNESS MEASUREMENT; ULSI CIRCUITS;

ETCHED FEATURE SIZE; FACET RESIST LOSS; TETRAETHYLORTHOSILICATE; TRANSFORMER COUPLED PLASMA;

REACTIVE ION ETCHING;

EID: 0035519122 PISSN: 10711023 EISSN: None Source Type: Journal
DOI: 10.1116/1.1414116 Document Type: Article

Times cited : (35)

References (14)

1
- 0022092551
- D. Chin, S. H. Dhong, and G. J. Long, J. Electrochem. Soc. 132, 1705 (1985).
- (1985) J. Electrochem. Soc. , vol.132 , pp. 1705
- Chin, D.¹ Dhong, S.H.² Long, G.J.³

2
- 36549097874
- E. S. G. Shaqfeh and C. W. Jurgensen, J. Appl. Phys. 66, 4664 (1989).
- (1989) J. Appl. Phys. , vol.66 , pp. 4664
- Shaqfeh, E.S.G.¹ Jurgensen, C.W.²

3
- 0000279745
- K. P. Giapis, G. R. Scheller, R. A. Gottscho, W. S. Hobson, and Y. H. Lee, Appl. Phys. Lett. 57, 983 (1990).
- (1990) Appl. Phys. Lett. , vol.57 , pp. 983
- Giapis, K.P.¹ Scheller, G.R.² Gottscho, R.A.³ Hobson, W.S.⁴ Lee, Y.H.⁵

4
- 0346651219
- J. C. Arnold and H. H. Swain, J. Appl. Phys. 70, 5314 (1991).
- (1991) J. Appl. Phys. , vol.70 , pp. 5314
- Arnold, J.C.¹ Swain, H.H.²

5
- 0000302625
- S. J. Ingram, J. Appl. Phys. 68, 500 (1990).
- (1990) J. Appl. Phys. , vol.68 , pp. 500
- Ingram, S.J.¹

6
- 36549100677
- J. W. Coburn and H. F. Winters, Appl. Phys. Lett. 55, 2730 (1989).
- (1989) Appl. Phys. Lett. , vol.55 , pp. 2730
- Coburn, J.W.¹ Winters, H.F.²

7
- 0004255148
- Academic, New York
- D. M. Manos and D. L. Flamm, Plasma Etching - An Introduction (Academic, New York, 1989), pp. 405-408.
- (1989) Plasma Etching - An Introduction , pp. 405-408
- Manos, D.M.¹ Flamm, D.L.²

8
- 33847605942
- San Francisco, unpublished
- D. J. Vitkavage, A. Kornblit, R. A Nicholas, D. P. Favreau, and S. C. Me Nevin, 1991 Tegal Plasma Proceedings Symposium, San Francisco, 1991 (unpublished).
- (1991) 1991 Tegal Plasma Proceedings Symposium
- Vitkavage, D.J.¹ Kornblit, A.² Nicholas, R.A.³ Favreau, D.P.⁴ Me Nevin, S.C.⁵

9
- 0005208812
- M. F. Doemling, N. R. Rueger, and G. S. Oehrlein, Appl. Phys. Lett. 69, 10 (1996).
- (1996) Appl. Phys. Lett. , vol.69 , pp. 10
- Doemling, M.F.¹ Rueger, N.R.² Oehrlein, G.S.³

10
- 0003753462
- Macmillan, New York
- E. D. Rainville and P. E. Bedient, Elementary Differential Equations (Macmillan, New York, 1981).
- (1981) Elementary Differential Equations
- Rainville, E.D.¹ Bedient, P.E.²

11
- 0000963830
- K. Y. Lee and W. S. Huang, J. Vac. Sci. Technol. B 11, 2807 (1993).
- (1993) J. Vac. Sci. Technol. B , vol.11 , pp. 2807
- Lee, K.Y.¹ Huang, W.S.²

12
- 33847605281
- Institute of Electrical Engineers of Japan, Tokyo
- A. Takahashi, N. Ikegami, M. Kobayashi, and J. Kanamori, 1998 Dry Process Symposium (Institute of Electrical Engineers of Japan, Tokyo, 1989), p. 251.
- (1989) 1998 Dry Process Symposium , pp. 251
- Takahashi, A.¹ Ikegami, N.² Kobayashi, M.³ Kanamori, J.⁴

13
- 0032154604
- T. Ohiwa, A. Kojima, M. Skine, and I. Sakai, Jpn. J. Appl. Phys., Part 1 37, 5060 (1998).
- (1998) Jpn. J. Appl. Phys., Part 1 , vol.37 , pp. 5060
- Ohiwa, T.¹ Kojima, A.² Skine, M.³ Sakai, I.⁴

14
- 0031672938
- T. E. F. M. Standaert, M. Schaepkens, N. R. Rueger, P. G. M. Sebel, G. S. Oehrlein, and J. M. Cook, J. Vac. Sci. Technol. A 16, 239 (1998).
- (1998) J. Vac. Sci. Technol. A , vol.16 , pp. 239
- Standaert, T.E.F.M.¹ Schaepkens, M.² Rueger, N.R.³ Sebel, P.G.M.⁴ Oehrlein, G.S.⁵ Cook, J.M.⁶

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.