Characterization of silicon isotropic etch by inductively coupled plasma etch in post-CMOS processing

Proceedings of the IEEE Micro Electro Mechanical Systems (MEMS)

Volumn , Issue , 2000, Pages 568-573

  Zhu, Xu ^a   Greve, David W ^a   Fedder, Gary K ^a  

^a CARNEGIE MELLON UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; CMOS INTEGRATED CIRCUITS; MICROMACHINING; PLASMA ETCHING; SEMICONDUCTING SILICON;

INDUCTIVELY COUPLED PLASMA (ICP) ETCHING;

MICROELECTROMECHANICAL DEVICES;

EID: 0033692977     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (6)