Investigations of the isotropic etch of an ICP source for silicon microlens mold fabrication

Journal of Micromechanics and Microengineering

Volumn 15, Issue 4, 2005, Pages 873-882

  Larsen, Kristian Pontoppidan ^a   Ravnkilde, Jan T ^b   Hansen, Ole ^a  

^a TECHNICAL UNIVERSITY OF DENMARK   (Denmark)

^b Dicon A/S   (Denmark)

Author keywords

[No Author keywords available]

Indexed keywords

DESORPTION; INDUCTIVELY COUPLED PLASMA; OPTICAL WAVEGUIDES; REACTIVE ION ETCHING; SCANNING ELECTRON MICROSCOPY; SILICON; SURFACE ROUGHNESS;

ETCHING PROPERTIES; ISOTROPIC ETCHING; MOLD FABRICATION; NUMERICAL APERTURE;

MICROLENSES;

EID: 17444372774     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/15/4/028     Document Type: Article

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