Electron impact-assisted carbon film growth on Ru(0001): Implications for next-generation EUV lithography

Journal of Physical Chemistry C

Volumn 111, Issue 12, 2007, Pages 4491-4494

  Kyriakou, Georgios ^a   Davis, David J ^a   Grant, Robert B ^b   Watson, David J ^a   Keen, Anthony ^b   Tikhov, Mintcho S ^a   Lambert, Richard M ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^b Lithography Subsystems   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; FILM GROWTH; HYDROCARBONS; IRRADIATION; RUTHENIUM; ULTRAVIOLET RADIATION;

CARBONACEOUS DEPOSITS; GASEOUS HYDROCARBONS; SEMICONDUCTOR CHIPS;

DEPOSITION;

EID: 34147187236     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp070485e     Document Type: Article

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