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Volumn 111, Issue 33, 2007, Pages 12165-12168
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Toward the in situ remediation of carbon deposition on Ru-capped multilayer mirrors intended for EUV lithography: Exploiting the electron-induced chemistry
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Author keywords
[No Author keywords available]
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Indexed keywords
CARBON;
CONTAMINATION;
DEPOSITION;
ELECTRON IRRADIATION;
LITHOGRAPHY;
MIRRORS;
RUTHENIUM;
ELECTRON-INDUCED CHEMISTRY;
ENERGY DISTRIBUTION;
LOW-ENERGY ELECTRON IRRADIATION;
MULTILAYER MIRRORS;
MULTILAYERS;
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EID: 34548554311
PISSN: 19327447
EISSN: 19327455
Source Type: Journal
DOI: 10.1021/jp074766y Document Type: Article |
Times cited : (10)
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References (14)
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