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Volumn 111, Issue 33, 2007, Pages 12165-12168

Toward the in situ remediation of carbon deposition on Ru-capped multilayer mirrors intended for EUV lithography: Exploiting the electron-induced chemistry

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; CONTAMINATION; DEPOSITION; ELECTRON IRRADIATION; LITHOGRAPHY; MIRRORS; RUTHENIUM;

EID: 34548554311     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp074766y     Document Type: Article
Times cited : (10)

References (14)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.