Reduction of oxide layer on Ru surface by atomic-hydrogen treatment

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 23, Issue 6, 2005, Pages 3129-3131

  Nishiyama, I ^a   Oizumi, H ^a   Motai, K ^a   Izumi, A ^b   Ueno, T ^b   Akiyama, H ^b   Namiki, A ^b  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

^b KYUSHU INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON CYCLOTRON RESONANCE; HYDROGEN; OXIDATION; REDUCTION; RUTHENIUM; SURFACES;

ATOMIC HYDROGEN; CAP LAYERS; EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL); OXIDE LAYERS;

OXIDES;

EID: 29044433412     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2130356     Document Type: Article

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