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Journal of Crystal Growth

Volumn 312, Issue 8, 2010, Pages 1267-1270

Real-time intrinsic stress generation during Volmer-Weber growth of Co by electrochemical deposition

(3) Zhi Luo, Tian a Guo, Lian a Cammarata, Robert C a

a Johns Hopkins University (United States)

Author keywords

A1. Atomic force microscopy; A1. Stresses; A2. Electrochemical growth; B1. Metals

Indexed keywords

A1. ATOMIC FORCE MICROSCOPY; A2. ELECTROCHEMICAL GROWTH; AMORPHOUS SUBSTRATE; B1. METALS; CO THIN FILMS; CONSTANT CURRENT; ELECTROCHEMICAL DEPOSITION; ELECTROCHEMICAL GROWTH; GROWTH OF FILMS; IN-SITU STRESS MEASUREMENT; INTRINSIC STRESS; ISLAND GROWTH MODE; ISLAND SIZE DISTRIBUTION; MORPHOLOGICAL CHANGES; POTENTIAL TRANSIENTS; REAL TIME; STRESS EVOLUTION; STRESS GENERATION; STRONG CORRELATION; TENSION-COMPRESSION;

AMORPHOUS FILMS; ATOMIC FORCE MICROSCOPY; COBALT; ELECTRODEPOSITION; EPITAXIAL GROWTH; MORPHOLOGY; PHYSICAL VAPOR DEPOSITION; REDUCTION; THIN FILMS;

DEPOSITION;

EID: 77949629189 PISSN: 00220248 EISSN: None Source Type: Journal
DOI: 10.1016/j.jcrysgro.2009.12.014 Document Type: Article

Times cited : (12)

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