Correlation of stress and atomic-scale surface roughness evolution during intermittent homoepitaxial growth of (111)-oriented Ag and Cu

Physical Review Letters

Volumn 93, Issue 5, 2004, Pages

  Friesen, C ^a   Thompson, C V ^a  

^a Massachusetts Institute of Technology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC SCALES; HOMOEPITAXIAL GROWTH; REFLECTION HIGH-ENERGY ELECTRON DIFFRACTION (RHEED); STRESS EVOLUTION;

CANTILEVER BEAMS; CAPACITANCE; COPPER; FILM GROWTH; HIGH ENERGY ELECTRON DIFFRACTION; MOLECULAR DYNAMICS; MULTILAYERS; SILICON WAFERS; SILVER; SURFACE ROUGHNESS; TENSILE STRESS; THERMODYNAMICS; TRANSMISSION ELECTRON MICROSCOPY; VACUUM;

THIN FILMS;

EID: 69349106226     PISSN: 00319007     EISSN: None     Source Type: Journal    
DOI: 10.1103/PhysRevLett.93.056104     Document Type: Article

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