Mechanisms inducing compressive stress during electrodeposition of Ni

Journal of Applied Physics

Volumn 97, Issue 1, 2005, Pages

  Hearne, Sean J ^a   Floro, Jerry A ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CAPILLARITY MODELS; CAPILLARITY STRESS; GLASS THERMOMETER BULBS; MULTIBEAM OPTICAL STRESS SENSOR (MOSS);

CAPILLARITY; ELECTRODEPOSITION; GOLD; NICKEL; OPTICAL SENSORS; SCANNING TUNNELING MICROSCOPY; SILICON WAFERS; THERMOMETERS; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

COMPRESSIVE STRESS;

EID: 19944433758     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1819972     Document Type: Article

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