Low-damage surface modification of polymethylmethacrylate with argon-oxygen mixture plasmas driven by multiple low-inductance antenna units

Thin Solid Films

Volumn 518, Issue 13, 2010, Pages 3561-3565

  Setsuhara, Yuichi ^a,e   Cho, Ken ^a,e   Takenaka, Kosuke ^a,e   Shiratani, Masaharu ^b,e   Sekine, Makoto ^c,e   Hori, Masaru ^c,e   Ikenaga, Eiji ^d   Zaima, Shigeaki ^c  

^a OSAKA UNIVERSITY   (Japan)

^b KYUSHU UNIVERSITY   (Japan)

^c NAGOYA UNIVERSITY   (Japan)

^d JAPAN SYNCHROTRON RADIATION RESEARCH INSTITUTE   (Japan)

^e JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

Hard X ray photoelectron spectroscopy; Inductively coupled plasma; Low damage process; Low inductance antenna; PMMA; Polymer

Indexed keywords

ARGON-OXYGEN MIXTURES; CHEMICAL BONDING STATE; DAMAGE PROCESS; ETCHING DEPTH; ETCHING RATE; EXPOSURE-TIME; FLOATING POTENTIALS; HARD X-RAY PHOTOELECTRON SPECTROSCOPY; ION ENERGIES; LOW-INDUCTANCE ANTENNA; PLASMA POTENTIAL; PMMA FILMS; SURFACE MODIFICATION; WATER-COOLED SUBSTRATES;

ANTENNAS; ARGON; CHEMICAL BONDS; ETCHING; INDUCTANCE; INDUCTIVELY COUPLED PLASMA; ION BOMBARDMENT; MIXTURES; OXYGEN; PHOTOELECTRICITY; PHOTOIONIZATION; PHOTONS; PHOTORESISTS; POLYESTERS; SURFACE ROUGHNESS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 77949446282     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.11.045     Document Type: Article

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