Effect of Ar addition to an O2 plasma in an inductively coupled, traveling wave driven, large area plasma source: O2/Ar mixture plasma modeling and photoresist etching

Journal of Applied Physics

Volumn 90, Issue 7, 2001, Pages 3205-3211

  Takechi, K ^a,b   Lieberman, M A ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b NEC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035476923     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1398600     Document Type: Article

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