Production and control of large-area plasmas for meters-scale flat-panel-display processing with multiple low-inductanceantenna modules

Plasma Processes and Polymers

Volumn 4, Issue SUPPL.1, 2007, Pages

  Setsuhara, Yuichi ^a   Takenaka, Kosuke ^a   Ebe, Akinori ^b   Nishisaka, Kazuaki ^b  

^a OSAKA UNIVERSITY   (Japan)

^b EMD Corporation   (Japan)

Author keywords

Inductively coupled plasma; Internal antenna; Large area plasma; Meters scale processing; Plasma profile control

Indexed keywords

ACTIVE CONTROL; AMORPHOUS HYDROGENATED CARBON FILMS; CONTROL CAPABILITIES; CONTROL TECHNOLOGIES; DEPOSITION PROFILES; DIELECTRIC ISOLATION; DISCHARGE CHAMBER; HIGH DENSITY PLASMAS; HIGH-DENSITY; INTERNAL ANTENNA; INTERNAL ANTENNAS; LARGE-AREA PLASMA; LIA MODULE; LOW-INDUCTANCE ANTENNA; LOW-VOLTAGE; METERS-SCALE PROCESSING; MINIMUM THICKNESS; MULTIPLE OPERATIONS; PLASMA PRODUCTION; PLASMA PROFILES; PLASMA REACTORS; PLASMA TECHNOLOGY; PLASMA-PROFILE CONTROL; POWER DEPOSITION; RF-POWER; U-SHAPED;

AMORPHOUS CARBON; AMORPHOUS FILMS; ANTENNAS; CARBON FILMS; CONTROL SYSTEM ANALYSIS; COUPLED CIRCUITS; ELECTRIC DISCHARGES; FLAT PANEL DISPLAYS; GAS DISCHARGE TUBES; INDUCTIVELY COUPLED PLASMA; METRIC SYSTEM; PHOTORESISTS; PLASMA DEPOSITION; PLASMA SOURCES;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 50349101111     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200731501     Document Type: Conference Paper

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