Properties of argon/oxygen mixture plasmas driven by multiple internal-antenna units

Surface and Coatings Technology

Volumn 202, Issue 22-23, 2008, Pages 5230-5233

  Setsuhara, Yuichi ^a   Takenaka, Kosuke ^a   Ebe, Akinori ^b   Han, Jeon G ^c  

^a OSAKA UNIVERSITY   (Japan)

^b EMD Corporation   (Japan)

^c Sungkyunkwan University   (South Korea)

Author keywords

Argon oxygen mixture plasma; Internal antenna; Ionic species; Low inductance antenna

Indexed keywords

ANTENNA ACCESSORIES; ANTENNAS; NONMETALS; OXYGEN;

ARGON/OXYGEN MIXTURE PLASMA; INTERNAL ANTENNA; IONIC SPECIES; LOW-INDUCTANCE ANTENNA; OXYGEN PARTIAL PRESSURE; PLASMA PARAMETERS;

PLASMAS;

EID: 50349086298     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2008.06.002     Document Type: Article

References (18)

1. Palmero A., Tomozeiu N., Vredenberg A.M., Arnoldbik W.M., and M Habraken F.H.P. Surf. Coat. Technol. 177-178 (2004) 215
2. Snyders R., Dauchot J.-P., and Hecq M. Plasma Process. Polym. 4 (2007) 113
3. Mogab C.J., Adams A.C., and Flamm D.L. J. Appl. Phys. 49 (1978) 3796
4. Butterbaugh J.W., Gray D.C., and Sawin H.H. J. Vac. Sci. Technol. B9 (1989) 1461
5. Ono T., Mizutani T., Goto Y., and Kure T. Jpn. J. Appl. Phys. 39 (2000) 5003
6. Nagai M., Hayashi T., Hori M., and Okamoto H. Jpn. J. Appl. Phys. 45 (2006) 7100
7. Takechi K., and Lieberman M.A. J. Appl. Phys. 90 (2001) 3205
8. Worsley M.A., Bent S.F., Fullera N.C.M., and Dalton T. J. Appl. Phys. 100 (2006) 083301
9. Kang E.T., and Zhang Y. Adv. Mater. 12 (2000) 1481
10. Setsuhara Y., Shoji T., Ebe A., Baba S., Yamamoto N., Takahashi K., Ono K., and Miyake S. Surf. Coat. Technol. 174-175 (2003) 33
11. Setsuhara Y., Takenaka K., Ebe A., and Nishisaka K. Plasma Process. Polym. 4 (2007) S628
12. Setsuhara Y., Takenaka K., Ebe A., and Nishizaka K. Solid State Phenomena 127 (2007) 239
13. Deguchi H., Yoneda H., Kato K., Kubota K., Hayashi T., Ogata K., Ebe A., Takenaka K., and Setsuhara Y. Jpn. J. Appl. Phys. 45 (2006) 8042
14. Takenaka K., Setsuhara Y., Nishisaka K., and Ebe A. Jpn. J. Appl. Phys. 45 (2006) 8046
15. Takenaka K., Setsuhara Y., Nishisaka K., and Ebe A. Plasma Process. Polym. 4 (2007) S1009
16. Takenaka K., Sera T., Ebe A., and Setsuhara Y. Plasma Process. Polym. 4 (2007) S1013
17. Tsuda O., Ishihara M., Koga Y., Fujiwara S., Setsuhara Y., and Sato N. J. Phys. Chem. B 109 (2005) 4917
18. Takahashi E., Nishigami Y., Tomyo A., Fujiwara M., Kaki H., Kubota K., Hayashi T., Ogata K., Ebe A., and Setsuhara Y. Jpn. J. Appl. Phys. 46 (2007) 1280