Highly anisotropic etching of polysilicon by time-modulation bias

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 39, Issue 8, 2000, Pages 5003-5009

  Ono, Tetsuo ^a   Mizutani, Tatsumi ^a   Goto, Yasushi ^a   Kure, Tokuo ^a  

^a HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; ELECTRON CYCLOTRON RESONANCE; LASER PULSES; PULSE MODULATION; SILICON WAFERS; SUBSTRATES; VOLTAGE CONTROL;

MICROTRENCHING; POLYSILICON;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 0034245163     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.5003     Document Type: Article

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