X-ray photoelectron spectroscopy for analysis of plasma-polymer interactions in Ar plasmas sustained via RF inductive coupling with low-inductance antenna units

Thin Solid Films

Volumn 518, Issue 13, 2010, Pages 3555-3560

  Setsuhara, Yuichi ^a,e   Cho, Ken ^a,e   Shiratani, Masaharu ^b,e   Sekine, Makoto ^c,e   Hori, Masaru ^c,e   Ikenaga, Eiji ^d   Zaima, Shigeaki ^c  

^a OSAKA UNIVERSITY   (Japan)

^b KYUSHU UNIVERSITY   (Japan)

^c NAGOYA UNIVERSITY   (Japan)

^d JAPAN SYNCHROTRON RADIATION RESEARCH INSTITUTE   (Japan)

^e JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

Ar plasma; Hard X ray photoelectron spectroscopy; Inductively coupled plasma; Low damage process; Low inductance antenna; Plasma polymer interactions; PMMA; XPS

Indexed keywords

AR PLASMAS; DAMAGE PROCESS; HARD X-RAY PHOTOELECTRON SPECTROSCOPY; LOW-INDUCTANCE ANTENNA; POLYMER INTERACTIONS; XPS;

ANTENNAS; ARGON; CHEMICAL BONDS; INDUCTANCE; INDUCTIVELY COUPLED PLASMA; ION BOMBARDMENT; IONS; PHOTOELECTRICITY; PHOTOELECTRONS; PHOTOIONIZATION; PHOTONS; PHOTORESISTS; POLYMER FILMS; POLYMERS; SPECTRUM ANALYSIS; SURFACE ROUGHNESS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 77949442344     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.11.038     Document Type: Article

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