Low-k SiOCH film etching process and its diagnostics employing Ar/C 5F10O/N2 plasma

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 45, Issue 9 A, 2006, Pages 7100-7104

  Nagai, Mikio ^a   Hayashi, Takayuki ^a   Hori, Masaru ^a   Okamoto, Hidekazu ^b  

^a NAGOYA UNIVERSITY   (Japan)

^b ASAHI GLASS CO LTD   (Japan)

Author keywords

CF; Density; Etching; Fluorocarbon; IRLAS; Low k; Plasma; SiOCH

Indexed keywords

DISSOCIATION; ETCHING; FLUOROCARBONS; IONIZATION; PLASMA DIAGNOSTICS; PLASMAS; SEMICONDUCTING SILICON;

DISSOCIATIVE IONIZATION; HARMONIC ETCHING; IRLAS; QUADRUPOLE MASS SPECTROSCOPY (QMS);

DIELECTRIC FILMS;

EID: 33749001166     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.7100     Document Type: Article

References (19)

1. L. B. Rothman: J. Electrochemical. Soc. 127 (1980) 2216.
2. S. P. Sun, S. P. Murarkaand C. J. Lee: J. Vac. Sci. Technol. B 6 (1988) 1763.
3. M. J. Shapiro, S. V. Nguyen, T. Matsuda and D. Dobuzinsky: Thin Solid Films 270 (1995) 503.
4. T. Usami, K. Shimokawa and M. Yoshimaru: Jpn. J. Appl. Phys. 33 (1994) 408.
5. W. W. Lee and P. S. Ho: Mater. Res. Soc. Bull. 22 (1997) 19.
6. Y. Feurprier, Y. Chinzei, M. Ogata, T. Kikuchi, M. Ozawa, T. Ichiki and Y. Horiike: J. Vac. Sci. Technol. A 17 (1999) 1556.
7. R. Chatterjee, S. Karecki, R. Reif, T. Sparks, V. Vartanian and B. Goolsby: J. Electrochem. Soc. 148 (2001) G721.
8. M. Nakamura, M. Hori, T. Goto, M. Ito and N. Ishii: J. Vac. Sci. Technol. A 19 (2001) 2134.
9. R. Chatterjee, S. Karecki, R. Reif, V. Vartanian and T. Sparks: J. Electrochem. Soc. 149 (2002) G276.
10. S. Karecki, L. Pruette, R. Reif, T. Sparks, L. Beu and V. Vartanian: J. Vac. Sci. Technol. A 16 (1998) 2722.
11. S. Karecki, Chatterjee, L. Pruette, R. Reif, V. Vartanian, T. Sparks, L. Beu and K. Novoselov: J. Vac. Sci. Technol. B 19 (2001) 1269.
12. S. Karecki, R. Chatterjee, L. Pruette, R. Reif, V. Vartanian, T. Sparks and L. Beu: J. Vac. Sci. Technol. B 19 (2001) 1306.
13. H. Toyoda, M. Ito and H. Sugai: Jpn. J. Appl. Phys. 36 (1997) 3730.
14. C. M. M. R. Bruce and R. A. Bonham: Phys. Rev. A 44 (1991) 2921.
15. D. Margreiter, G. Walder, H. Deutsch, H. U. Poil, C. Winkler, K. Stephan and T. D. Märk: Int. J. Mass Spectrom. Ion Processes 100 (1990) 143.
16. M. Nagai: Dr. Thesis, Quantum Engineering: Nagoya University, Nagoya, 2006.
17. C. Q. Jian, A. Garscadden and P. D. Haaland: Chem. Phys. Lett. 297 (1998) 121.
18. K. Karahashi, K. Yanai, K. Ishikawa, H. Tsuboi, K. Kurihara and M. Nakamura: J. Vac. Sci. Technol. A 22 (2004) 1166.
19. K. Miyata, M. Hori and T. Goto: J. Vac. Sci. Technol. A 14 (1996) 2083.