Development of large area plasma reactor using multiple low-inductance antenna modules for flat panel display processing

Solid State Phenomena

Volumn 127, Issue , 2007, Pages 239-244

  Setsuhara, Y ^a   Takenaka, K ^a   Ebe, A ^b   Nishisaka, K ^b  

^a OSAKA UNIVERSITY   (Japan)

^b EMD Corp   (Japan)

Author keywords

Flat panel display; High density plasma; Large area plasma; Low inductance antenna

Indexed keywords

ANTENNAS; PLASMA DENSITY; PLASMAS;

ARGON PRESSURE; LARGE AREA PLASMA; LOW INDUCTANCE ANTENNA; PLASMA REACTORS;

FLAT PANEL DISPLAYS;

EID: 37549017234     PISSN: 10120394     EISSN: None     Source Type: Book Series    
DOI: 10.4028/3-908451-33-7.239     Document Type: Conference Paper

References (22)

1. M. A. Lieberman and A. J. Lichtenberg: Principles of Plasma Discharges and Materials Processing (Wiley, New York, 1994)
2. A. A. Howling, J. L. Dorier, C. Hollenstein and U. Kroll, J. Vac. Sci. Technol. A Vol. 10 (1992), p. 1080
3. V. Vahedi V, C. K. Birdsall, M. A. Lieberman, G. DiPeso and T. D. Rognlien, Phys. Fluids B Vol.5 (1993), p. 2719
4. J. Hopwood, Plasma Sources Sci. Tehcnol. Vol. 1 (1992), p. 109
5. P. L. G. Ventzek, R. J. Hoekstra, and M. J. Kushner, J. Vac. Sci. Technol. A Vol. 12 (1994), p. 461
6. L. J. Mahoney, A. E. Wendt, E. Barrios, C. J. Richards, and J. L. Shohet, J. Appl. Phys. Vol. 76 (1994), p. 2041
7. R. A. Stewart, P. Vitello and D. B. Graves, J. Vac. Sci. Technol. B Vol. 12 (1994), p. 478
8. Y. Setsuhara, S. Miyake, Y. Sakawa and T. Shoji, Jpn. J. Appl. Phys. Vol. 38 (1999), p. 4263
9. S.-H. Seo, C.W. Chung, H.-Y. Chang, Surf. Coat. Technol. Vol. 131 (2000), p. 1
10. Y. Setsuhara, S. Miyake, Y. Sakawa and T. Shoji, Surf. Coat. Technol. Vol. 136 (2001), p. 60
11. M. Moisan, C.Baudry and P. Leprince, IEEE Trans. Plasma Sci. Vol. PS-3 (1975), p. 1004
12. M. Moisan, A. Shivarova and A.W. Trivelpiece, Plasma Phys. Vol. 24 (1982), p. 1331
13. M. Nagatsu, G. Xu, M. Yamage, M. Kanoh and H. Sugai, Japan. J. Appl. Phys. Vol. 35 (1996), p. L341
14. I. Odrobina, J. Kudera and M. Kando, Plasma Sources Sci. Technol. Vol. 7 (1998), p. 238
15. J. Perrin, J. Schmitt, C., Hollenstein, A. Howling and L. Sansonnens, Plasma Phys. Control. Fusion Vol. 42 (2000), p. B353
16. Y. Wu and M.A. Lieberman, Plasma Sources Sci. Technol. Vol. 9 (2000), p. 210
17. M. H. Khater and L. J. Overzet, Plasma Sources Sci. Technol. Vol. 9 (2000), p. 545
18. Y. Setsuhara, T. Shoji, A. Ebe, S. Baba, N. Yamamoto, K. Takahashi, K. Ono and S. Miyake, Surf. Coatings. Tehcnol.Vol. 174-175 (2003), p. 33
19. T. Shoji, Y. Sakawa, S. Nakazawa, K. Kadota and T. Sato, Plasma Sources Sci. Technol. Vol. 2 (1993), p. 5
20. J. Q. Zhang, Y. Setsuhara, T. Ariyasu and S. Miyake, J. Vac. Sci. Technol. A Vol. 14 (1996), p. 2163
21. M. Tuszewski, J. T. Scheuer and R. A. Adler, Surf. Coat. Technol. Vol. 93 (1997), p. 203
22. A. V. Vasenkov and M. J. Kushner: Phys. Rev. E. Vol. 66 (2002), p. 411.