Characterization of amorphous hydrogenated carbon formed by low-pressure inductively coupled plasma enhanced chemical vapor deposition using multiple low-inductance antenna units

Journal of Physical Chemistry B

Volumn 109, Issue 11, 2005, Pages 4917-4922

  Tsuda, Osamu ^a   Ishihara, Masatou ^a   Koga, Yoshinori ^a   Fujiwara, Shuzo ^a   Setsuhara, Yuichi ^b   Sato, Naoyuki ^c  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b OSAKA UNIVERSITY   (Japan)

^c IBARAKI UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ANTENNAS; DEGRADATION; DEHYDROGENATION; FRICTION; HARDNESS; HYDROGENATION; INDUCTIVELY COUPLED PLASMA; ION BOMBARDMENT; PLASMA DENSITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PRESSURE EFFECTS; RAMAN SCATTERING; REFRACTIVE INDEX; STRESS ANALYSIS; TRIBOLOGY;

AMORPHOUS CARBON; CARBON FILMS; PULSE BIASING TECHNIQUES; WEAR RATE;

CARBON;

EID: 15744394433     PISSN: 15206106     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp045412z     Document Type: Article

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