Characterization of inductively-coupled RF plasma sources with multiple low-inductance antenna units

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 45, Issue 10 B, 2006, Pages 8046-8049

  Takenaka, Kosuke ^a   Setsuhara, Yuichi ^a   Nishisaka, Kazuaki ^b   Ebb, Akinori ^b   Sugiura, Shinya ^c   Takahashi, Kazuo ^c   Ono, Koichi ^c  

^a OSAKA UNIVERSITY   (Japan)

^b EMD Corporation   (Japan)

^c KYOTO UNIVERSITY   (Japan)

Author keywords

Inductively coupled RF plasma; Internal antenna; Large area plasma; Plasma source

Indexed keywords

ANTENNAS; INDUCTANCE; INDUCTIVELY COUPLED PLASMA; PLASMA DENSITY;

INDUCTIVELY-COUPLED RF PLASMA; INTERNAL ANTENNA; LARGE-AREA PLASMA;

PLASMA SOURCES;

EID: 34547854380     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.8046     Document Type: Article

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