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Volumn 45, Issue 10 B, 2006, Pages 8042-8045
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Effects of antenna size and configurations in large-area RF plasma production with internal low-inductance antenna units
a a a a a a b c c
b
EMD Corporation
(Japan)
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Author keywords
Antenna size; Configuration; Low inductance internal antenna; Plasma sources
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Indexed keywords
ANTENNAS;
INDUCTANCE;
LIQUID CRYSTAL DISPLAYS;
PLASMA SOURCES;
ANTENNA SIZE;
LOW-INDUCTANCE INTERNAL ANTENNA;
INDUCTIVELY COUPLED PLASMA;
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EID: 34547911074
PISSN: 00214922
EISSN: 13474065
Source Type: Journal
DOI: 10.1143/JJAP.45.8042 Document Type: Article |
Times cited : (46)
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References (14)
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