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Volumn 45, Issue 10 B, 2006, Pages 8042-8045

Effects of antenna size and configurations in large-area RF plasma production with internal low-inductance antenna units

Author keywords

Antenna size; Configuration; Low inductance internal antenna; Plasma sources

Indexed keywords

ANTENNAS; INDUCTANCE; LIQUID CRYSTAL DISPLAYS; PLASMA SOURCES;

EID: 34547911074     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.8042     Document Type: Article
Times cited : (46)

References (14)
  • 9
    • 34547897628 scopus 로고    scopus 로고
    • Y. Setsuhara: J. Plasma Fusion Res. 81 (2005) 85 [in Japanese].
    • Y. Setsuhara: J. Plasma Fusion Res. 81 (2005) 85 [in Japanese].


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.