Silicon+- Post processing CMOS wafers to create integrated sensors, MEMS and electro-optic systems

SAIEE Africa Research Journal

Volumn 101, Issue 1, 2010, Pages 3-10

  Walton, A J ^a   Stevenson, J T M ^a   Underwood, I ^a   Terry, J G ^a   Smith, S ^a   Parkes, W ^a   Dunare, C ^a   Lin, H ^a   Li, Y ^a   Henderson, R ^a   Renshaw, D ^a   Rae, B ^a   Muir, K ^a   Desmulliez, M ^a,b   Flynn, D ^a,b   Macintosh, M J ^a,c   Holland, W S ^a,c   Murray, A F ^a   Tang, T B ^a   Bunting, A ^a  

^a UNIVERSITY OF EDINBURGH   (United Kingdom)

^b HERIOT WATT UNIVERSITY   (United Kingdom)

^c UK ASTRONOMY TECHNOLOGY CENTRE   (United Kingdom)

Author keywords

Electro optic systems; MEMS; Silicon post processing CMOS integrated sensors

Indexed keywords

CMOS INTEGRATED CIRCUITS; FOUNDRIES; MEMS;

ELECTRO-OPTIC SYSTEMS; INTEGRATED SENSORS; MATERIALS AND TECHNOLOGIES; MEMS-BASED SENSORS; SILICON-BASED INTEGRATED CIRCUITS; SYSTEM INTEGRATION; TECHNOLOGY APPLICATION; TECHNOLOGY INTEGRATION;

SILICON WAFERS;

EID: 77949293384     PISSN: 00382221     EISSN: None     Source Type: Journal    
DOI: 10.23919/saiee.2010.8532213     Document Type: Conference Paper

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