A miniaturized multiwire proportional chamber using CMOS wafer scale post-processing

ESSDERC 2006 - Proceedings of the 36th European Solid-State Device Research Conference

Volumn , Issue , 2006, Pages 129-132

  Carballo, V M Blanco ^a   Chefdeville, M ^b   Van Der Graaf, H ^b   Salm, C ^a   Aarnink, A A I ^a   Smits, S M ^a   Altpeter, D M ^a   Timmermans, J ^b   Visschers, J L ^b   Schmitz, J ^a  

^a UNIVERSITY OF TWENTE   (Netherlands)

^b NIKHEF   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC POTENTIAL; ELECTRODES; IONIZING RADIATION; SILICON WAFERS; X RAY DIFFRACTION;

MULTIWIRES; PROCESS INTEGRATION;

CMOS INTEGRATED CIRCUITS;

EID: 84943201512     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ESSDER.2006.307655     Document Type: Conference Paper

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