Fabrication of diffractive optical elements using the CMOS process

Journal of Micromechanics and Microengineering

Volumn 12, Issue 1, 2002, Pages 21-25

  Dai, Ching Liang ^a   Chen, Hung Lin ^b   Lee, Chi Yuan ^b   Chang, Pei Zen ^b  

^a ORIENTAL INSTITUTE OF TECHNOLOGY   (Taiwan)

^b NATIONAL TAIWAN UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

FABRICATION; NUMERICAL ANALYSIS; OPTICAL DESIGN; OPTICAL PROPERTIES; PLASMA ETCHING; SEMICONDUCTOR DEVICE MANUFACTURE;

COMPLEMENTARY METAL OXIDE SEMICONDUCTOR PROCESS; DIFFRACTIVE OPTICAL ELEMENTS; EIGHT PHASE LEVEL GRATINGS; MICROFABRICATION;

DIFFRACTION GRATINGS;

EID: 0036150571     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/12/1/304     Document Type: Article

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