Preparation of epoxy/silica and epoxy/titania hybrid resists via a sol-gel process for nanoimprint lithography

Journal of Physical Chemistry C

Volumn 114, Issue 5, 2010, Pages 2179-2183

  Wu, Chun Chang ^a   Hsu, Steve Lien Chung ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

DIGLYCIDYL ETHER OF BISPHENOL-A; EPOXY RESIN MATRIX; GLASS TRANSITION TEMPERATURE; HIGH-DENSITY; IMPRINT LITHOGRAPHY; INORGANIC NANOPARTICLE; INTERFACIAL INTERACTION; METAL ALKOXIDE PRECURSORS; NANO-METER SCALE; PREPOLYMERS; PURE EPOXY; SOLVENT FREE; TEREPHTHALATE; THERMO-OXIDATIVE STABILITY; TRANSMISSION ELECTRON; WELL-DISPERSED;

AGGLOMERATION; COUPLING AGENTS; EPOXY RESINS; ETHERS; ETHYLENE; GELS; GLASS TRANSITION; NANOCOMPOSITES; NANOIMPRINT LITHOGRAPHY; NANOPARTICLES; NANOSTRUCTURED MATERIALS; PHENOLS; RESINS; SILICA; SOL-GELS; SOLS; TIN; TITANIUM COMPOUNDS; TITANIUM DIOXIDE; TRANSMISSION ELECTRON MICROSCOPY;

SOL-GEL PROCESS;

EID: 77249139823     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp908141f     Document Type: Article

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