Mr-NIL 6000 - New epoxy-based curing resist for efficient processing in combined thermal and UV nanoimprint lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6517, Issue PART 2, 2007, Pages

  Schuster, Christine ^a   Kubenz, Mike ^a   Reuther, Freimut ^a   Fink, Marion ^a   Gruetzner, Gabi ^a  

^a MICRO RESIST TECHNOLOGY GMBH   (Germany)

Author keywords

Differential scanning calorimetry; Epoxy; Isothermal imprint; Lithography; Nanoimprint; Resist; Thermal stability

Indexed keywords

CURING; DIFFERENTIAL SCANNING CALORIMETRY; EPOXY RESINS; ETCHING; GLASS TRANSITION; NANOIMPRINT LITHOGRAPHY; SUPERCONDUCTING TRANSITION TEMPERATURE; THERMODYNAMIC STABILITY;

ELEVATED TEMPERATURE; IMPRINT MACHINES; ISOTHERMAL IMPRINTS; PATTERN TRANSFER; PROCESSING CONDITIONS;

PHOTORESISTS;

CURING; GLASS TRANSITION TEMPERATURE; LITHOGRAPHY; POLYEPOXIDES;

EID: 35048903120     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.713094     Document Type: Conference Paper

References (3)

1. K. Pfeiffer, M. Fink, G. Gruetzner, G. Bleidiessel, H. Schulz, H. Scheer, 26th International Conference on Micro- and Nano-Engineering, Sep 18-21 2000, Jena, Germany, published in Microelectron. Eng. 57-58 (2001), 381-387
2. C. F. Tsang, Microelectron. Int. 17/ 3 (2000), 27-41
3. R. Feng, R. J. Farris, J. Micromech. Michoeng. 13 (2003), 80-88