Study of nano-imprint for sub-100nm patterning by using SU-8 3000NIL resist

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6151 II, Issue , 2006, Pages

  Sekiguchi, Atsushi ^a   Kono, Yoshiyuki ^a   Mori, Satoshi ^b   Honda, Nao ^b   Hirai, Yoshihiko ^c  

^a Jpn   (Japan)

^b NIPPON KAYAKU CO LTD   (Japan)

^c Osaka City University   (Japan)

Author keywords

Chemically amplified negative resist; FT IR; Nano imprint; Outgas; Rheometer; SU 8

Indexed keywords

CROSSLINKING; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MICROELECTROMECHANICAL DEVICES; NANOTECHNOLOGY; OPTICAL DEVICES; RHEOMETERS;

CHEMICALLY AMPLIFIED NEGATIVE RESIST; NANO-IMPRINT; OUTGAS; SU-8;

PHOTORESISTS;

EID: 33745589481     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.656310     Document Type: Conference Paper

References (9)

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