-
1
-
-
33750724450
-
3 prepared by pulsed laser deposition
-
DOI 10.1063/1.2374806
-
S. Lee, J. Hwang, J. Kim, S. Jeong, and C. Cho, Appl. Phys. Lett. 0003-6951, 89, 182906 (2006). 10.1063/1.2374806 (Pubitemid 44705731)
-
(2006)
Applied Physics Letters
, vol.89
, Issue.18
, pp. 182906
-
-
Lee, S.-A.1
Hwang, J.-Y.2
Kim, J.-P.3
Jeong, S.-Y.4
Cho, C.-R.5
-
2
-
-
41449094688
-
-
0038-1101,. 10.1016/j.sse.2007.10.045
-
Y. Zhou, C. Ahyi, T. I. Smith, M. Bozack, C. Tin, J. Williams, M. Park, A. Cheng, J. Park, D. Kim, Solid-State Electron. 0038-1101, 52, 756 (2008). 10.1016/j.sse.2007.10.045
-
(2008)
Solid-State Electron.
, vol.52
, pp. 756
-
-
Zhou, Y.1
Ahyi, C.2
Smith, T.I.3
Bozack, M.4
Tin, C.5
Williams, J.6
Park, M.7
Cheng, A.8
Park, J.9
Kim, D.10
-
3
-
-
51849108058
-
-
0003-6951,. 10.1063/1.2969282
-
Y. C. Chang, W. H. Chang, H. C. Chiu, L. T. Tung, C. H. Lee, K. H. Shiu, M. Hong, J. Kwo, J. M. Hong, and C. C. Tsai, Appl. Phys. Lett. 0003-6951, 93, 053504 (2008). 10.1063/1.2969282
-
(2008)
Appl. Phys. Lett.
, vol.93
, pp. 053504
-
-
Chang, Y.C.1
Chang, W.H.2
Chiu, H.C.3
Tung, L.T.4
Lee, C.H.5
Shiu, K.H.6
Hong, M.7
Kwo, J.8
Hong, J.M.9
Tsai, C.C.10
-
4
-
-
34250703717
-
2 on GaN
-
DOI 10.1063/1.2746057
-
Y. C. Chang, H. C. Chiu, Y. J. Lee, M. L. Huang, K. Y. Lee, M. Hong, Y. N. Chiu, J. Kwo, and Y. H. Wang, Appl. Phys. Lett. 0003-6951, 90, 232904 (2007). 10.1063/1.2746057 (Pubitemid 46960302)
-
(2007)
Applied Physics Letters
, vol.90
, Issue.23
, pp. 232904
-
-
Chang, Y.C.1
Chiu, H.C.2
Lee, Y.J.3
Huang, M.L.4
Lee, K.Y.5
Hong, M.6
Chiu, Y.N.7
Kwo, J.8
Wang, Y.H.9
-
5
-
-
0036687452
-
Electrical characterization of GaN metal oxide semiconductor diodes using MgO as the gate oxide
-
DOI 10.1149/1.1489689
-
J. Kim, B. Gila, R. Mehandru, J. W. Johnson, J. H. Shin, K. P. Lee, B. Luo, A. Onstine, C. R. Abernathy, S. J. Pearton, J. Electrochem. Soc. 0013-4651, 149, G482 (2002). 10.1149/1.1489689 (Pubitemid 34962476)
-
(2002)
Journal of the Electrochemical Society
, vol.149
, Issue.8
-
-
Kim, J.1
Gila, B.2
Mehandru, R.3
Johnson, J.W.4
Shin, J.H.5
Lee, K.P.6
Luo, B.7
Onstine, A.8
Abernathy, C.R.9
Pearton, S.J.10
Ren, F.11
-
6
-
-
33744801086
-
3/GaN heterostructure
-
DOI 10.1063/1.2209178
-
C. Liu, E. F. Chor, L. S. Tan, and Y. Dong, Appl. Phys. Lett. 0003-6951, 88, 222113 (2006). 10.1063/1.2209178 (Pubitemid 43839224)
-
(2006)
Applied Physics Letters
, vol.88
, Issue.22
, pp. 222113
-
-
Liu, C.1
Chor, E.F.2
Tan, L.S.3
Dong, Y.4
-
7
-
-
43049147116
-
Current conduction mechanisms in atomic-layer-deposited HfO2 /nitrided SiO2 stacked gate on 4H silicon carbide
-
DOI 10.1063/1.2908870
-
K. Y. Cheong, J. H. Moon, H. J. Kim, W. Bahng, and N. K. Kim, J. Appl. Phys. 0021-8979, 103, 084113 (2008). 10.1063/1.2908870 (Pubitemid 351623617)
-
(2008)
Journal of Applied Physics
, vol.103
, Issue.8
, pp. 084113
-
-
Cheong, K.Y.1
Moon, J.H.2
Kim, H.J.3
Bahng, W.4
Kim, N.-K.5
-
8
-
-
0037224356
-
-
0026-2714,. 10.1016/S0026-2714(02)00122-1
-
C. T. Wu, A. Mieckowski, R. S. Ridley, Sr., G. Dolny, T. Grebs, J. Linn, and J. Ruzyllo, Microelectron. Reliab. 0026-2714, 43, 43 (2003). 10.1016/S0026-2714(02)00122-1
-
(2003)
Microelectron. Reliab.
, vol.43
, pp. 43
-
-
Wu, C.T.1
Mieckowski, A.2
Ridley Sr., R.S.3
Dolny, G.4
Grebs, T.5
Linn, J.6
Ruzyllo, J.7
-
9
-
-
33750820446
-
3 film grown on GaN
-
DOI 10.1016/j.tsf.2006.07.036, PII S0040609006008364
-
L. M. Lin, Y. Luo, P. T. Lai, and K. M. Lai, Thin Solid Films 0040-6090, 515, 2111 (2006). 10.1016/j.tsf.2006.07.036 (Pubitemid 44716170)
-
(2006)
Thin Solid Films
, vol.515
, Issue.4
, pp. 2111-2115
-
-
Lin, L.M.1
Luo, Y.2
Lai, P.T.3
Lau, K.M.4
-
10
-
-
79956004334
-
2/n-GaN metal-insulator- semiconductor structures
-
DOI 10.1063/1.1486266
-
Y. Nakano and T. Jimbo, Appl. Phys. Lett. 0003-6951, 80, 4756 (2002). 10.1063/1.1486266 (Pubitemid 34783158)
-
(2002)
Applied Physics Letters
, vol.80
, Issue.25
, pp. 4756
-
-
Nakano, Y.1
Jimbo, T.2
-
11
-
-
33947601387
-
Comparison of metal-oxide-semiconductor capacitors on c- and m-plane gallium nitride
-
DOI 10.1063/1.2716309
-
K. Matocha, V. Tilak, and G. Dunne, Appl. Phys. Lett. 0003-6951, 90, 123511 (2007). 10.1063/1.2716309 (Pubitemid 46482287)
-
(2007)
Applied Physics Letters
, vol.90
, Issue.12
, pp. 123511
-
-
Matocha, K.1
Tilak, V.2
Dunne, G.3
-
12
-
-
0043175234
-
-
0018-9383,. 10.1109/TED.2003.813456
-
K. Matocha, R. J. Gutmann, and T. P. Chow, IEEE Trans. Electron Devices 0018-9383, 50, 1200 (2003). 10.1109/TED.2003.813456
-
(2003)
IEEE Trans. Electron Devices
, vol.50
, pp. 1200
-
-
Matocha, K.1
Gutmann, R.J.2
Chow, T.P.3
-
13
-
-
36148980875
-
2 on photochemical treated GaN
-
DOI 10.1149/1.2803054
-
M. K. Lee, C. L. Ho, and J. Y. Zeng, Electrochem. Solid-State Lett. 1099-0062, 11, D9 (2008). 10.1149/1.2803054 (Pubitemid 350115960)
-
(2008)
Electrochemical and Solid-State Letters
, vol.11
, Issue.1
-
-
Lee, M.-K.1
Ho, C.-L.2
Zeng, J.-Y.3
-
14
-
-
0001126465
-
-
0003-6951,. 10.1063/1.1332815
-
L. W. Tu, W. C. Kuo, K. H. Lee, P. H. Tsao, C. M. Lai, A. K. Chu, and J. K. Sheu, Appl. Phys. Lett. 0003-6951, 77, 3788 (2000). 10.1063/1.1332815
-
(2000)
Appl. Phys. Lett.
, vol.77
, pp. 3788
-
-
Tu, L.W.1
Kuo, W.C.2
Lee, K.H.3
Tsao, P.H.4
Lai, C.M.5
Chu, A.K.6
Sheu, J.K.7
-
15
-
-
55049127248
-
-
0040-6090,. 10.1016/j.tsf.2008.08.059
-
M. T. Ta, D. Briand, Y. Guhel, J. Bernard, J. C. Pesant, and B. Boudart, Thin Solid Films 0040-6090, 517, 450 (2008). 10.1016/j.tsf.2008.08.059
-
(2008)
Thin Solid Films
, vol.517
, pp. 450
-
-
Ta, M.T.1
Briand, D.2
Guhel, Y.3
Bernard, J.4
Pesant, J.C.5
Boudart, B.6
-
17
-
-
33644915272
-
-
0040-6090,. 10.1016/j.tsf.2005.09.123
-
H. Wong, B. Sen, V. Filip, and M. C. Poon, Thin Solid Films 0040-6090, 504, 192 (2006). 10.1016/j.tsf.2005.09.123
-
(2006)
Thin Solid Films
, vol.504
, pp. 192
-
-
Wong, H.1
Sen, B.2
Filip, V.3
Poon, M.C.4
-
18
-
-
0032114641
-
-
0021-4922,. 10.1143/JJAP.37.4158
-
H. Fukuda, M. Miura, S. Sakuma, and S. Nomura, Jpn. J. Appl. Phys., Part 1 0021-4922, 37, 4158 (1998). 10.1143/JJAP.37.4158
-
(1998)
Jpn. J. Appl. Phys., Part 1
, vol.37
, pp. 4158
-
-
Fukuda, H.1
Miura, M.2
Sakuma, S.3
Nomura, S.4
-
19
-
-
0035341541
-
2 thin films for gate dielectric applications
-
DOI 10.1016/S0167-9317(00)00525-6, PII S0167931700005256
-
J. -H. Yoo, S. -W. Nam, S. -K. Kang, Y. -H. Jeong, D. -H. Ko, J. -H. Ku, and H. -J. Lee, Microelectron. Eng. 0167-9317, 56, 187 (2001). 10.1016/S0167-9317(00)00525-6 (Pubitemid 32335361)
-
(2001)
Microelectronic Engineering
, vol.56
, Issue.1-2
, pp. 187-190
-
-
Yoo, J.-H.1
Nam, S.-W.2
Kang, S.-K.3
Jeong, Y.-H.4
Ko, D.-H.5
Ku, J.-H.6
Lee, H.-J.7
-
20
-
-
34047260562
-
3/GaN metal-oxide-semiconductor structures
-
DOI 10.1063/1.2719228
-
Y. Q. Wu, T. Shen, P. D. Ye, and G. D. Wilk, Appl. Phys. Lett. 0003-6951, 90, 143504 (2007). 10.1063/1.2719228 (Pubitemid 46550157)
-
(2007)
Applied Physics Letters
, vol.90
, Issue.14
, pp. 143504
-
-
Wu, Y.Q.1
Shen, T.2
Ye, P.D.3
Wilk, G.D.4
-
21
-
-
59149100571
-
-
0040-6090,. 10.1016/j.tsf.2008.10.137
-
W. S. Woon, S. D. Hutagalung, and K. Y. Cheong, Thin Solid Films 0040-6090, 517, 2808 (2009). 10.1016/j.tsf.2008.10.137
-
(2009)
Thin Solid Films
, vol.517
, pp. 2808
-
-
Woon, W.S.1
Hutagalung, S.D.2
Cheong, K.Y.3
-
22
-
-
37749050006
-
-
0169-4332,. 10.1016/j.apsusc.2007.08.012
-
K. J. Wang and K. Y. Cheong, Appl. Surf. Sci. 0169-4332, 254, 1981 (2008). 10.1016/j.apsusc.2007.08.012
-
(2008)
Appl. Surf. Sci.
, vol.254
, pp. 1981
-
-
Wang, K.J.1
Cheong, K.Y.2
-
24
-
-
36248970008
-
3 gate dielectric films deposited by atomic layer deposition on 4H-SiC
-
DOI 10.1063/1.2805742
-
C. M. Tanner, Y. C. Perng, C. Frewin, S. E. Saddow, and J. P. Chang, Appl. Phys. Lett. 0003-6951, 91, 203510 (2007). 10.1063/1.2805742 (Pubitemid 350128962)
-
(2007)
Applied Physics Letters
, vol.91
, Issue.20
, pp. 203510
-
-
Tanner, C.M.1
Perng, Y.-C.2
Frewin, C.3
Saddow, S.E.4
Chang, J.P.5
-
25
-
-
33746281113
-
Band offsets of high K gate oxides on III-V semiconductors
-
DOI 10.1063/1.2213170
-
J. Robertson and B. Falabretti, J. Appl. Phys. 0021-8979, 100, 014111 (2006). 10.1063/1.2213170 (Pubitemid 44102019)
-
(2006)
Journal of Applied Physics
, vol.100
, Issue.1
, pp. 014111
-
-
Robertson, J.1
Falabretti, B.2
|