Deposition and characterization of titania-silica optical multilayers by asymmetric bipolar pulsed dc sputtering of oxide targets

Journal of Physics D: Applied Physics

Volumn 43, Issue 4, 2010, Pages

  Sagdeo, P R ^a   Shinde, D D ^a   Misal, J S ^a   Kamble, N M ^a   Tokas, R B ^a   Biswas, A ^a   Poswal, A K ^a   Thakur, S ^a   Bhattacharyya, D ^a   Sahoo, N K ^a   Sabharwal, S C ^a  

^a BHABHA ATOMIC RESEARCH CENTRE   (India)

Author keywords

[No Author keywords available]

Indexed keywords

DISORDER PARAMETERS; EDGE FILTERS; FABRY-PEROT MIRROR; FUNCTIONAL CHARACTERISTICS; GRAZING INCIDENCE; HE-CD LASERS; HIGH-PASS; MASS DENSITIES; METALLIC TARGETS; MICRO-STRUCTURAL; MICROSTRUCTURAL PROPERTIES; MULTI-LAYER MIRRORS; OPTICAL REFLECTION; PULSED DC; PULSED DC MAGNETRON SPUTTERING; PULSED DC SPUTTERING; REFLECTOMETRY; SURFACE AND INTERFACES; TIO; TITANIA-SILICA;

ATOMIC FORCE MICROSCOPY; ELECTRIC FIELDS; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; HIGH PASS FILTERS; MIRRORS; MULTILAYERS; OPTICAL CONSTANTS; OPTICAL PROPERTIES; SILICA; SURFACE TOPOGRAPHY; TARGETS; TITANIUM DIOXIDE;

OPTICAL MULTILAYERS;

EID: 74849109703     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/43/4/045302     Document Type: Article

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