Atomic force microscopy study of surface roughening of sputter-deposited TiN thin films

Journal of Applied Physics

Volumn 92, Issue 7, 2002, Pages 3559-3563

  Liu, Z J ^a   Jiang, N ^a   Shen, Y G ^a   Mai, Y W ^a,b  

^a CITY UNIVERSITY OF HONG KONG   (Hong Kong)

^b UNIVERSITY OF SYDNEY   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

AFM; FOURIER; GROWTH EXPONENT; HEIGHT-HEIGHT CORRELATION FUNCTIONS; KINETIC SURFACE ROUGHENING; LINEAR GROWTH; POWER-SPECTRA; ROOM TEMPERATURE; ROUGHNESS EXPONENT; SCALING ANALYSIS; SCALING BEHAVIOR; SILICON SUBSTRATES; SMOOTHING EFFECTS; SURFACE GROWTH; SURFACE PROFILES; SURFACE-ROUGHENING; TIN THIN FILMS; TRANSFORMATION TECHNIQUES;

ATOMIC FORCE MICROSCOPY; FOURIER ANALYSIS; FOURIER TRANSFORMS; METALLIC FILMS; SHOT NOISE; SURFACE MEASUREMENT;

TITANIUM NITRIDE;

EID: 18644363386     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1504497     Document Type: Article

References (26)

1. P. Meakin, Phys. Rep. 235, 189 (1993). prp PRPLCM 0370-1573
2. T. Halpin-Healy and Y. C. Zhang, Phys. Rep. 254, 215 (1995). prp PRPLCM 0370-1573
3. A.-L. Barabási and H. E. Stanley, Fractal Concepts in Surface Growth (Cambridge University Press, Cambridge, England, 1995).
4. H. Gao and W. D. Nix, Annu. Rev. Mater. Sci. 29, 173 (1999). arm ARMSCX 0084-6600
5. Y. G. Shen, J. Yao, D. J. O'Connor, B. V. King, and R. J. MacDonald, Phys. Rev. B 56, 9894 (1997). prb PRBMDO 0163-1829
6. Y. G. Shen, Y.-W. Mai, Q. C. Zhang, D. R. McKenzie, W. D. FcFall, and W. E. McBride, J. Appl. Phys. 87, 177 (2000). jap JAPIAU 0021-8979
7. F. Edwards and D. R. Wilkinson, Proc. R. Soc. London, Ser. A 381, 17 (1982). prz PRLAAZ 0962-8444
8. R. P. U. Karunasiri, R. Bruinsma, and J. Rudnick, Phys. Rev. Lett. 62, 788 (1989). prl PRLTAO 0031-9007
9. R. L. Schwoebel, J. Appl. Phys. 40, 614 (1969); jap JAPIAU 0021-8979
10. R. L. Schwoebel and E. J. Shipsey, 37, 3682 (1966). jap JAPIAU 0021-8979
11. W. W. Mullins, J. Appl. Phys. 28, 333 (1957). jap JAPIAU 0021-8979
12. F. Family, Physica A 168, 561 (1990). pha PHYADX 0378-4371
13. N. Savvides and B. Window, J. Appl. Phys. 64, 225 (1988). jap JAPIAU 0021-8979
14. H. E. Rebenne and D. G. Bhat, Surf. Coat. Technol. 63, 1 (1994). sct SCTEEJ 0257-8972
15. J. Takadoum and H. H. Bennani, Surf. Coat. Technol. 96, 272 (1997). sct SCTEEJ 0257-8972
16. J. Hu, M. Ameen, G. Leusink, D. Webb, and J. T. Hillman, Thin Solid Films 308-309, 589 (1997). tsf THSFAP 0040-6090
17. P. Patsalas, C. Charitidis, and S. Logothetidis, Surf. Coat. Technol. 125, 335 (2000). sct SCTEEJ 0257-8972
18. G. Palasantzas, Phys. Rev. B 48, 14472 (1993). prb PRBMDO 0163-1829
19. E. A. Eklund, R. Bruinsma, J. Rudnick, and R. S. Willams, Phys. Rev. Lett. 67, 1759 (1991). prl PRLTAO 0031-9007
20. M. Kardar, G. Parisi, and Y. C. Zhang, Phys. Rev. Lett. 56, 889 (1986). prl PRLTAO 0031-9007
21. S. Das Sarma and P. I. Tamborenea, Phys. Rev. Lett. 66, 325 (1991). prl PRLTAO 0031-9007
22. Jason T. Drotar, Y.-P. Zhao, T.-M. Lu, and G.-C. Wang, Phys. Rev. E 59, 117 (1999). pre PLEEE8 1063-651X
23. H.-N. Yang, Y.-P. Zhao, G.-C. Wang, and T.-M. Lu, Phys. Rev. Lett. 76, 3774 (1996). prl PRLTAO 0031-9007
24. M. Siegert and M. Plischke, Phys. Rev. Lett. 73, 1517 (1994); prl PRLTAO 0031-9007
25. M. Rusanen, I. T. Koponen, J. Heinonen, and T. Ala-Nissila, 86, 5317 (2001). prl PRLTAO 0031-9007
26. W. M. Tong, E. J. Snyder, R. S. Williams, A. Yanase, and Y. Segawa, Surf. Sci. Lett. 277, L63 (1992). ssl SUSCAS 0167-2584