Zirconia and zirconia-silica thin films deposited by magnetron sputtering

Thin Solid Films

Volumn 420-421, Issue , 2002, Pages 47-53

  Kuo, D H ^a   Chien, C H ^a   Huang, C H ^a  

^a NATIONAL DONG HWA UNIVERSITY   (Taiwan)

Author keywords

Dielectric properties; Mechanical properties; Physical vapor deposition; Zirconium silicate

Indexed keywords

ADHESION; ELECTRIC BREAKDOWN; ELECTRIC CONDUCTIVITY; FILM GROWTH; MAGNETRON SPUTTERING; PERMITTIVITY; PHYSICAL VAPOR DEPOSITION; REFRACTIVE INDEX; SILICA; SPUTTER DEPOSITION; STRESS ANALYSIS; ZIRCONIA;

DEPOSITION TEMPERATURES;

THIN FILMS;

EID: 4243743731     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)00738-1     Document Type: Conference Paper

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