Chemical-mechanical polishing of SiO2 thin films studied by X-ray reflectivity

Thin Solid Films

Volumn 280, Issue 1-2, 1996, Pages 37-42

  Wallace, W E ^a   Wu, W L ^a   Carpio, R A ^b  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b SEMATECH   (United States)

Author keywords

Chemical vapour deposition; Depth profiling; Silicon oxide; Surface roughness

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DENSITY (OPTICAL); DISSOLUTION; INTERFACES (MATERIALS); PLASMA APPLICATIONS; POLISHING; QUARTZ; SILICA; SILICON WAFERS; SUBSTRATES; SURFACE ROUGHNESS; X RAY ANALYSIS;

DEPTH PROFILING; FREE SURFACE; OFF SPECULAR REFLECTIVITY; X RAY REFLECTIVITY;

THIN FILMS;

EID: 0030195715     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(95)08178-X     Document Type: Article

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