Roughness analysis of optical films and substrates by atomic force microscopy

Thin Solid Films

Volumn 288, Issue 1-2, 1996, Pages 8-13

  Ruppe, C ^a   Duparre A ^a  

^a FRAUNHOFER INSTITUTE FOR APPLIED OPTICS AND PRECISION ENGINEERING   (Germany)

Author keywords

Atomic force microscopy; Light scattering; Optical thin films; Surface roughness

Indexed keywords

ATOMIC FORCE MICROSCOPY; BANDWIDTH; COATING TECHNIQUES; LIGHT SCATTERING; OPTICAL COATINGS; OPTICAL CORRELATION; SPECTRUM ANALYSIS; SUBSTRATES; SURFACE ROUGHNESS; SURFACE STRUCTURE; THIN FILMS;

ANGLE RESOLVED SCATTERING (ARS) MEASUREMENTS; POWER SPECTRAL DENSITIES (PSD); SUBSTRATE REPLICATION EFFECTS; SURFACE TOPOGRAPHY;

OPTICAL FILMS;

EID: 0030287730     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)08807-4     Document Type: Article

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