A comparison between the atomic force microscopy and X-ray reflectivity on the characterization of the roughness of a surface

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5392, Issue , 2004, Pages 123-131

  Su, Hui Chia ^a   Lin, Ming Zhe ^a   Huang, Tzu Wen ^a   Lee, Chih Hao ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

Atomic Force Microscopy; Surface Roughness; X ray Reflectivity

Indexed keywords

MICROSCOPY PROBES; SAPPHIRE WAFERS; SELF-AFFINE SURFACES; X-RAY REFLECTIVITY;

ATOMIC FORCE MICROSCOPY; CARRIER CONCENTRATION; CHEMICAL POLISHING; DATA REDUCTION; DENSITY (SPECIFIC GRAVITY); REFLECTION; REFRACTIVE INDEX; SAPPHIRE; SCATTERING; THIN FILMS; VIBRATIONS (MECHANICAL); X RAY ANALYSIS;

SURFACE ROUGHNESS;

EID: 5444275093     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.539761     Document Type: Conference Paper

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