Molecular dynamic studies on deformation of polymer resist during thermal nano imprint lithographic process

Tribology Letters

Volumn 36, Issue 3, 2009, Pages 209-222

  Woo, Young Seok ^a   Lee, Dong Eon ^a   Lee, Woo Il ^a  

^a Seoul National University   (South Korea)

Author keywords

Deformation; Density; Molecular dynamic simulation (MDS); Nano imprint lithography (NIL); Nanoscale patterning; Nanotribology; Polymer resist

Indexed keywords

AMORPHOUS POLYETHYLENES; ATOM DISTRIBUTION; ATOMIC FORCE MICROSCOPES; DEFORMATION BEHAVIOR; DEFORMATION CHARACTERISTICS; FORCE FIELDS; IMPRINTING PROCESS; LENNARD-JONES POTENTIAL; LITHOGRAPHIC PROCESS; LOCAL DENSITY; MOLECULAR DYNAMIC SIMULATIONS; MOLECULAR FORCES; MOLECULAR MOBILITY; NANO IMPRINT; NANO IMPRINT LITHOGRAPHY (NIL); NANO SCALE; NANOSCALE PATTERNING; NUMERICAL RESULTS; PERIODIC BOUNDARY CONDITIONS; POLYMER MOLECULE; POLYMER RESIST; RESIST DEFORMATION; SIMULATION RESULT; SMALL SCALE; SURFACE GEOMETRIES; SYSTEM TEMPERATURE;

COMPUTER SIMULATION; DEFORMATION; MOLECULAR DYNAMICS; MOLECULAR STRUCTURE; MOLECULES; NANOSTRUCTURED MATERIALS; NANOTRIBOLOGY; POLYMERS;

NANOIMPRINT LITHOGRAPHY;

EID: 72849148782     PISSN: 10238883     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11249-009-9474-y     Document Type: Article

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