Molecular dynamics study of pattern transfer in nanoimprint lithography

Tribology Letters

Volumn 25, Issue 2, 2007, Pages 93-102

  Kang, Ji Hoon ^a   Kim, Kwang Seop ^a   Kim, Kyung Woong ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

Adhesion; Friction; Molecular dynamics simulation; Nanoimprint lithography; Polymer deformation

Indexed keywords

CELL MULTIPOLE METHOD; NANOIMPRINT LITHOGRAPHY; PATTERN TRANSFER; POLYMER DEFORMATION BEHAVIOR;

ADHESION; ASPECT RATIO; DEFORMATION; FRICTION; MOLECULAR DYNAMICS; PLASTIC FILMS; POLYMETHYL METHACRYLATES; THERMOSTATS;

LITHOGRAPHY;

ADHESION; ASPECT RATIO; DEFORMATION; FRICTION; LITHOGRAPHY; MOLECULAR DYNAMICS; PLASTIC FILMS; POLYMETHYL METHACRYLATES; THERMOSTATS;

EID: 33846466598     PISSN: 10238883     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11249-006-9053-4     Document Type: Article

References (32)

1. S.Y. Chou, P.R. Krauss, P.J. Renstrom, Appl. Phys. Lett. 67 (1995) 3114
2. S.Y. Chou, P.R. Krauss, P.J. Renstrom, J. Vac. Sci. Technol. B 14 (1996) 4129
3. S.Y. Chou, P.R. Krauss, W. Zhang, L.J. Guo, L. Zhuang, J. Vac. Sci. Technol. B 15 (1997) 2897
4. M.D. Austin, H. Ge, W. Wu, M. Li, Z. Yu, D. Wasserman, S.A. Lyon, S.Y. Chou, Appl. Phys. Lett. 84 (2004) 5299
5. S.Y. Chou, C. Keimel, J. Gu, Nature 417 (2002) 835
6. Y. Hirai, S. Yoshida, N. Takagi, Y. Tanaka, H. Yabe, K. Sasaki, H. Sumitani, K. Yamamoto, Jpn. J. Appl. Phys. 42 (2003) 3863
7. L.J. Guo, J. Phys. D: Appl. Phys. 37 (2004) R123
8. H.C. Scheer, H. Schulz, T. Hoffmann, C.M. Sotomayor Torres, J. Vac. Sci. Technol. B 16 (1998) 3917
9. L.J. Heyderman, H. Schift, C. David, J. Gobrecht, T. Schweizer, Microelectronic Eng. 54 (2000) 229
10. H.C. Scheer, H. Schulz, Microelectronic Eng. 54 (2001) 311
11. D.S. Macintyre, S. Thoms, Microelectronic Eng. 78-79 (2005) 670
12. G.L.W. Cross, B.S. O'Connel, J.B. Pethica, Appl. Phys. Lett. 86 (2004) 081902
13. C. Martin, L. Ressier, J.P. Peyrade, Physica E 17 (2003) 523
14. Y. Hirai, S. Yoshida, N. Takagi, J. Vac. Sci. Technol. B 21 (2003) 2765
15. Y. Hirai, T. Konishi, T. Yoshikawa, S. Yoshida, J. Vac. Sci. Technol. B 22 (2004) 3288
16. W.B. Young, Microelectronic. Eng. 77 (2005) 405
17. A. Koike, J. Phys. Chem. B 103 (1999) 4578
18. Y.R. Jeng C.C. Chen S.H. Shyu, Tribol. Lett. 15 (2003) 293
19. S. Bair, C. McCabe, P.T. Cummings, Phys. Rev. Lett. 88 (2002) 058302
20. W.C.D. Cheong, L.C. Zhang, Nanotechnology 11 (2000) 173
21. I. Szlufarska R.K. Kalia A. Nakano P. Vashishta, Appl. Phys. Lett. 85 (2004) 378
22. C.Y. Tang, L.C. Zhang, Nanotechnology 16 (2005) 15.
23. R. Komanduri, N. Chandrasekaran, L.M. Raff, Phys. Rev. B 61 (2000) 14007
24. Y.R. Jeng, P.C. Tsai, T.H. Fang, Tribol. Lett. 18 (2005) 315
25. C.D. Lorenz, E.B. Webb III, M.J. Stevens, M. Chandross, G.S. Grest, Tribol. Lett. 19 (2005) 93
26. Q.C. Hsu, C.D. Wu, T.H. Fang, Jpn. J. Appl. Phys. 43 (2004) 7665
27. J.H. Kang, K.S. Kim, K.W. Kim, J. Korean Soc. Mech. Eng A 29 (2005) 852
28. O. Okada, K. Oka, S. Kuwajima, S. Toyoda, K. Tanabe, Comput. Theo. Polymer Sci. 10 (2000) 371
29. H. Sun, Macromolecules 28 (1995) 701
30. H. Sun, D. Rigby, Spectrochimica Acta Part A 53 (1997) 1301
31. H. Kittel, Introduction to Solid State Physics (Wiley, New York, 1986)
32. M.P. Allen, D.J. Tildesley, Computer Simulation of Liquids (Clarendon Press, Oxford, 1987)