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Journal of the Electrochemical Society

Volumn 157, Issue 1, 2010, Pages

Study of the surface reactions in ALD hafnium aluminates

(6) Nyns, L a,b Delabie, A a Pourtois, G a Van Elshocht, S a Vinckier, C b De Gendt, S a,b

a IMEC (Belgium)

b UNIVERSITY OF LEUVEN (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

BINARY OXIDES; DEHYDROXYLATIONS; DENSITY FUNCTIONAL THEORY SIMULATIONS; DEPOSITION TECHNIQUE; GROWTH BEHAVIOR; GROWTH PER CYCLE; HAFNIUM ALUMINATE; NON-VOLATILE MEMORY TECHNOLOGY; SURFACE SITES;

ALUMINUM; ALUMINUM COMPOUNDS; ATOMIC LAYER DEPOSITION; CHEMISORPTION; COMPUTER CRIME; DENSITY FUNCTIONAL THEORY; GROWTH (MATERIALS); HAFNIUM; HYDROLYSIS;

SURFACE REACTIONS;

EID: 72249083950 PISSN: 00134651 EISSN: None Source Type: Journal
DOI: 10.1149/1.3246802 Document Type: Article

Times cited : (22)

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