Deposition of cubic boron nitride films on diamond-coated WC:Co inserts

Diamond and Related Materials

Volumn 18, Issue 11, 2009, Pages 1387-1392

  Chong, Y M ^a   Zhang, W J ^a   Yang, Y ^a   Ye, Q ^a   Bello, I ^a   Lee, S T ^a  

^a CITY UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

Chemical vapor deposition; Cubic boron nitride; Cutting inserts; Mechanical properties

Indexed keywords

BI-LAYER; BN FILMS; BORON TRIFLUORIDE; CUBIC BORON NITRIDE (CBN); CUBIC BORON NITRIDE FILMS; CUBIC PHASE; DIAMOND SURFACES; FERROUS METALS; FLOWRATE RATIO; GAS FLOWRATE; HEXAGONAL PHASE; MACHINING STEELS; MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITIONS; SELECTIVE ETCHING; SUBSTRATE BIAS; SUBSTRATE BIAS VOLTAGES; TOOL COATING; TRIAL-AND-ERROR METHOD;

AERODYNAMICS; BORON; BORON CARBIDE; CHEMICAL REACTIONS; CHEMICAL RESISTANCE; CHEMICAL VAPOR DEPOSITION; COATINGS; COBALT; CUBIC BORON NITRIDE; CYCLOTRONS; DEPOSITION; DIAMOND FILMS; DIAMONDS; ELECTRON CYCLOTRON RESONANCE; FLOW OF GASES; HARDNESS; MECHANICAL PROPERTIES; MICROWAVES; PHASE COMPOSITION; PLASMA DEPOSITION; SUBSTRATES; TUNGSTEN; TUNGSTEN CARBIDE;

BORON NITRIDE;

EID: 71849086977     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2009.08.010     Document Type: Article

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