Preparation of BN films by r.f. thermal plasma chemical vapour deposition

Journal of Materials Science

Volumn 31, Issue 3, 1996, Pages 713-720

  Matsumoto, S ^a   Nishida, N ^b,d   Akashi, K ^b   Sugai, K ^c  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^b TOKYO UNIVERSITY OF SCIENCE   (Japan)

^c Nachi Fujikoshi Corp   (Japan)

^d Sumitomo Metal Industries Ltd   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPOSITION EFFECTS; CRYSTAL STRUCTURE; CUBIC BORON NITRIDE; ELECTRON CYCLOTRON RESONANCE; FLUORINE; GASES;

BORON NITRIDE FILM; DEPOSITION RATE; FEED GAS; GAS SYSTEM; THERMAL PLASMA CHEMICAL VAPOUR DEPOSITION;

CERAMIC COATINGS;

EID: 0030084667     PISSN: 00222461     EISSN: None     Source Type: Journal    
DOI: 10.1007/BF00367890     Document Type: Article

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