Deposition of large-area, high-quality cubic boron nitride films by ECR-enhanced microwave-plasma CVD

Applied Physics A: Materials Science and Processing

Volumn 76, Issue 6, 2003, Pages 953-955

  Zhang, W J ^a   Chan, C Y ^a   Chan, K M ^a   Bello, I ^a   Lifshitz, Y ^a   Lee, S T ^a  

^a CITY UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

CUBIC BORON NITRIDE; ELECTRIC POTENTIAL; ELECTRON CYCLOTRON RESONANCE; FILM GROWTH; GASES; MIXTURES; PHONONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SPECTROSCOPY; SILICON; SUBSTRATES;

MICROWAVE ENERGY;

MATERIALS SCIENCE;

EID: 0037390571     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00339-002-1486-5     Document Type: Conference Paper

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