Properties of cubic boron nitride films with buffer layer control for stress relaxation using ion-beam-assisted deposition

Surface and Coatings Technology

Volumn 116-119, Issue , 1999, Pages 100-107

  Setsuhara, Y ^a   Kumagai, M ^b   Suzuki, M ^b   Suzuki, T ^a   Miyake, S ^a  

^a OSAKA UNIVERSITY   (Japan)

^b Kanagawa High Technology Foundation   (Japan)

Author keywords

Buffer layer control; Cubic boron nitride films; Ion beam assisted deposition; Stress relaxation; Teibdological properties

Indexed keywords

CERAMIC COATINGS; DEPOSITION; FILMS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; ION BEAMS; POLYCRYSTALLINE MATERIALS; SILICON WAFERS; STRESS ANALYSIS; STRESS RELAXATION; SYNTHESIS (CHEMICAL); TRANSMISSION ELECTRON MICROSCOPY; TRIBOLOGY;

BUFFER LAYER CONTROL; ION-BEAM-ASSISTED DEPOSITION;

CUBIC BORON NITRIDE;

EID: 0033312489     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(99)00237-6     Document Type: Article

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