Synthesis of boron nitride films using electron-cyclotron resonance microwave plasma and an H2-BF3-N2-Ar-He gas system

Chemical Vapor Deposition

Volumn 9, Issue 4, 2003, Pages 181-186

  Chan, Chit Yiu ^a   Zhang, Wenjun ^a   Chan, Ka Man ^a   Bello, Igor ^a   Lee, Shuit Tong ^a  

^a CITY UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

Crystallinity; Cubic boron nitride; ECR; Fluorine chemistry; Microwave plasma CVD

Indexed keywords

CRYSTALLINE MATERIALS; ELECTRON CYCLOTRON RESONANCE; MICROWAVE DEVICES; OXIDATION; PHYSICAL VAPOR DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SYNTHESIS (CHEMICAL); THIN FILMS;

CRYSTALLINITY; FLUORINE CHEMISTRY; HIGH-TEMPERATURE HIGH-PRESSURE (HTHP) PROCEDURES; MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION (CVD);

CUBIC BORON NITRIDE;

EID: 10644283901     PISSN: 09481907     EISSN: None     Source Type: Journal    
DOI: 10.1002/cvde.200306241     Document Type: Article

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