Gas heating in plasma-assisted sputter deposition

Applied Physics Letters

Volumn 87, Issue 7, 2005, Pages

  Palmero, A ^a   Rudolph, H ^a   Habraken, F H P M ^a  

^a UTRECHT UNIVERSITY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

BACKGROUND GAS; GROWING FILM; SPUTTERED ATOM; SPUTTERED PARTICLES;

DEPOSITION; FILM GROWTH; GAS DYNAMICS; PLASMA APPLICATIONS; PRESSURE EFFECTS; SPUTTER DEPOSITION; TEMPERATURE DISTRIBUTION;

GAS HEATING;

EID: 24144454816     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2010609     Document Type: Article

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