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Modern Physics Letters B

Volumn 23, Issue 26, 2009, Pages 3157-3170

Influence of continuous and discontinuous depositions on properties of ITO films prepard by DC magnetron sputtering

(3) Aiempanakit, K a Rakkwamsuk, P b Dumrongrattana, S b

a THAMMASAT UNIVERSITY (Thailand)

b KING MONGKUT'S UNIVERSITY OF TECHNOLOGY THONBURI (Thailand)

Author keywords

Continuous deposition; DC magnetron sputtering; Discontinuous deposition; ITO; Target poisoning

Indexed keywords

EID: 70350314400 PISSN: 02179849 EISSN: None Source Type: Journal
DOI: 10.1142/S0217984909021211 Document Type: Article

Times cited : (4)

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