Correlation between diffraction patterns and surface morphology to the model of oxygen diffusion into ITO films

Materials Chemistry and Physics

Volumn 115, Issue 1, 2009, Pages 154-157

  Chong, M K ^a   Pita, K ^a   Silalahi, S T H ^a  

^a Photonics Research Centre   (Singapore)

Author keywords

Electrical conductivity; Sputtering; Thin films

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; ATOMS; DIFFRACTION; DIFFUSION IN GASES; ELECTRIC CONDUCTIVITY; GRAIN BOUNDARIES; GRAIN SIZE AND SHAPE; HOLOGRAPHIC INTERFEROMETRY; OXYGEN; SURFACE DIFFUSION; THIN FILMS; TIN; TITANIUM COMPOUNDS; VACUUM; VACUUM TECHNOLOGY; X RAY DIFFRACTION ANALYSIS;

AFM IMAGES; ELECTRICAL CONDUCTIVITY; ELECTRICAL PROPERTIES; GRAIN SIZES; GRAIN-BOUNDARY SCATTERINGS; IN VACUUMS; INDIUM TIN OXIDE FILMS; ITO FILMS; OXYGEN ATOMS; OXYGEN DIFFUSIONS; POST-ANNEALING; POST-ANNEALING TEMPERATURES; POST-ANNEALING TREATMENTS; XRD PEAKS;

OXIDE FILMS;

EID: 61449239112     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2008.11.039     Document Type: Article

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