Influence of dc magnetron sputtering parameters on surface morphology of indium tin oxide thin films

Applied Surface Science

Volumn 221, Issue 1-4, 2004, Pages 136-142

  Jung, Yeon Sik ^a   Lee, Dong Wook ^a   Jeon, Duk Young ^b  

^a Samsung Corning Co Ltd   (South Korea)

^b Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

Atomic force microscopy; Indium tin oxide; Morphology; Sputtering

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTALLOGRAPHY; FLAT PANEL DISPLAYS; GLASS; GRAIN SIZE AND SHAPE; LEAKAGE CURRENTS; LIGHT EMITTING DIODES; MAGNETRON SPUTTERING; MORPHOLOGY; OPTOELECTRONIC DEVICES; SCANNING ELECTRON MICROSCOPY; SPUTTERING; SUBSTRATES; THIN FILMS;

GLASS SUBSTRATES; INDIUM TIN OXIDE (ITO); TRANSPARENT CONDUCTING OXIDE (TCO);

INDIUM COMPOUNDS;

EID: 0345171060     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(03)00862-6     Document Type: Article

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