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Thin Solid Films

Volumn 335, Issue 1-2, 1998, Pages 1-5

Room-temperature deposition of indium tin oxide thin films with plasma ion-assisted evaporation

(6) Laux, S a Kaiser, N a Zoller A b Gotzelmann R b Lauth, H c Bernitzki, H c

a FRAUNHOFER INSTITUTE FOR APPLIED OPTICS AND PRECISION ENGINEERING (Germany)

b EVONIK INDUSTRIES AG (Germany)

c JENOPTIK Laser Optik Systeme GmbH (Germany)

Author keywords

Indium tin oxide (ITO); Ion assisted deposition; Transparent semiconductors

Indexed keywords

DEPOSITION; ELECTRIC CONDUCTIVITY OF SOLIDS; EVAPORATION; MATHEMATICAL MODELS; PLASMA APPLICATIONS; REFRACTIVE INDEX; SEMICONDUCTING INDIUM COMPOUNDS;

INDIUM TIN OXIDE THIN FILMS; PLASMA ION-ASSISTED DEPOSITION; TRANSPARENT SEMICONDUCTORS;

THIN FILMS;

EID: 0032318143 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(98)00861-X Document Type: Article

Times cited : (155)

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