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Materials Science and Engineering: B

Volumn 136, Issue 1, 2007, Pages 37-40

Effect of sputtering pressure and annealing temperature on the properties of indium tin oxide thin films

(4) Gheidari, A Mohammadi a Behafarid, F a Kavei, G a Kazemzad, M a

a MATERIALS AND ENERGY RESEARCH CENTER (Iran)

Author keywords

Annealing; Electro optical; Indium tin oxide; Sputtering; Structural

Indexed keywords

ANNEALING; CRYSTAL GROWTH; ELECTRIC CONDUCTIVITY; ELECTROOPTICAL EFFECTS; INDIUM COMPOUNDS; OPACITY; PRESSURE EFFECTS; SCANNING ELECTRON MICROSCOPY; SPUTTER DEPOSITION; X RAY DIFFRACTION ANALYSIS;

DEPOSITION RATE; GLASS SUBSTRATES; OPTIMUM SPUTTERING PRESSURE; SPUTTERING PRESSURE EFFECTS;

THIN FILMS;

EID: 33845445989 PISSN: 09215107 EISSN: None Source Type: Journal
DOI: 10.1016/j.mseb.2006.08.058 Document Type: Article

Times cited : (52)

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